Epitaxial Equipment : MBE Systems

More than seven years ago, Veeco introduced the revolutionary GEN200 Cluster Tool Molecular Beam Epitaxy (MBE) System, delivering exceptional wafer quality for lab or fab optoelectronic applications.  Since than, it has become the industry's most cost effective 4x4" epiwafer growth of such devices as pump lasers, vertical cavity surface-emitting lasers (VCSELS) and heterojunction bipolar transistors (HBTs).

Our production systems are the first to incorporate a modular cluster tool architecture.  This enables our systems to deliver the industry's lowest cost per wafer in a footprint significantly smaller than comparable MBE tools.  This design also allows for up to two growth modules around the cluster tool to greatly increase throughput or accommodate incompatible materials.  Bulkhead installation is optional, to separate load lock modules from its cluster tool and growth modules, to optimize cleanroom space.
 
Today, we introduce the GEN200 Edge.  Through intense work, we've made the most cost-effective and highest-capacity multi-4" production MBE system even better—we've taken what works and optimized it.

The Veeco GEN200 Edge System incorporates enhancements to system hardware, sources and complementary components.