Process Equipment : Ion Beam Etch

The NEXUS IBE-420i Ion Beam Etching System offers higher device yields through improved CD sigma control for data storage applications. At the heart of the system is the new NEXUS ion source, which provides exceptional WIW rotated and 3D etch uniformity. Combined with an enhanced control system, Veeco's ion source also provides excellent WTW and RTR repeatability. Available in single or dual cluster configurations, The NEXUS IBE-420i is backward-compatible to existing Veeco device-net cluster front ends, providing low cost of ownership. The improved NEXUS platform offers better CoO toolsets, faster time to market for new applications, better asset utilization and faster install time.