Metrology & Instrumentation
Process Equipment
Epitaxial Equipment
Process Equipment : Ion Sources
Gridless End-Hall Ion Sources
Using intense magnetic fields and substantial electron currents, Veeco’s low maintenance, gridless ion sources produce a very high current density at lower energies than is practical with gridded sources. Gridless sources are available in several sizes and can be configured with or without filaments, depending upon the process requirements. Veeco offers the following Gridless End-Hall Ion Sources: Mark I; and Mark II.
Mark I+ Gridless Ion Source 
Gridless ion source with high beam current designed for vacuum coating processes improves process uniformity and prevents substrate damage.
Gridless ion source with high beam current designed for vacuum coating processes improves process uniformity and prevents substrate damage.
Mark I Gridless Ion Source
Ion source with high beam current for controlling film stress and stoichiometry, ideal for pre-clean/assisted deposition in small systems.
Ion source with high beam current for controlling film stress and stoichiometry, ideal for pre-clean/assisted deposition in small systems.
Mark II Gridless Ion Source
Industry standard for optical coating systems and the most widely used assist source, suitable for reactive and inert gases and high power densities.
Industry standard for optical coating systems and the most widely used assist source, suitable for reactive and inert gases and high power densities.
Mark II Gridless High Output
Industry standard for optical coating systems and the most widely used assist source, suitable for reactive and inert gases and high power densities.
Industry standard for optical coating systems and the most widely used assist source, suitable for reactive and inert gases and high power densities.
Mark II+ Gridless Ion Source
The Mark II+ represents an evolutionary improvement to the Mark line of gridless ion sources, the industry standard for optical coating systems.
The Mark II+ represents an evolutionary improvement to the Mark line of gridless ion sources, the industry standard for optical coating systems.
Mark II+ Gridless High Output
High Output Ion Source (with Hollow Cathode) is a gridless ion source designed for vacuum coating processes in chambers from 70-130 cm in diameter.
High Output Ion Source (with Hollow Cathode) is a gridless ion source designed for vacuum coating processes in chambers from 70-130 cm in diameter.
Mark II+ Controller
Ion Source Controller matches the plasma characteristics of End Hall ion sources, with graphical interface and automated arc recovery to maximize ion source performance.
Ion Source Controller matches the plasma characteristics of End Hall ion sources, with graphical interface and automated arc recovery to maximize ion source performance.